VULRC (Vilnius, Lithuania)
Vilnius University Laser Research Center
Vilnius University Laser Research Center (VULRC), renowned for the inception of optical parametric chirped pulse amplification (OPCPA) in the 90s, hosts state-of-the-art laboratories dedicated to fundamental and applied laser-related research. Over the decades, VULRC has been pivotal in establishing a robust industrial laser ecosystem and advancing cutting-edge laser technologies.
The research carried out at VULRC covers a broad range of topics: ultrafast laser-matter interactions and related nonlinear optical phenomena, development of novel laser and parametric sources, generation and application of broadband terahertz pulses, laser micromachining, time-resolved spectroscopy, nonlinear microscopy, laser-induced breakdown spectroscopy, and laser damage phenomena in optical coatings. Additionally, VULRC expertise extends to standardized metrology of optical components, 3D micro-/nano-lithography, and nanophotonics.
In recent years, VULRC has expanded its research interests by introducing new topics focused on biomedical applications using secondary laser radiation sources, few-optical cycle pulses, high harmonic generation, laser-inscribed bulk-based and surface beam shaping meta-optics, and novel approaches to high-precision optical manufacturing.
These recent endeavors position VULRC at the forefront of technological innovation, ensuring continuous contributions to scientific progress and industrial applications. Successful integration of long-standing expertise with innovative advancements makes VULRC an internationally recognized leader in laser research.
Website: www.lasercenter.vu.lt
Contact:
Ona Balachninaite
Dalia Kaskelyte

Research highlights
A summary of key research highlights across various fields, including nonlinear optics, laser physics, material sciences, and laser materials processing, showcasing recent advances and notable publications:
Laser physics
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- High-Power OPCPA System design. The advanced high peak (5.5 TW) and high average (>53 W) power optical parametric chirped pulse amplification (OPCPA) system delivering sub-9 fs, 53.8 mJ near-IR pulses at a repetition rate of 1 kHz, with excellent temporal contrast and <220 mrad carrier-envelope phase (CEP) long-term stability [Opt. Express 25, 5797 (2017)], and its commercial upgrade as a SYLOS laser at ELI-ALPS [J. Phys. Photonics 2, 045003 (2020)].
- Laser Damage and Fatigue Phenomena in Optical Coatings. Study of laser-induced damage mechanisms in optical coatings, focusing on fatigue behavior under repetitive laser pulse exposure. Insights into laser-induced damage threshold (LIDT) scaling laws [Opt. Express 30(16), 28401–28413 (2022)] enhance understanding of optics durability and robust performance. Standardization and harmonization of testing methods ensure consistent results and reliable cross-system comparisons, contributing to the development of ISO standards [ISO FDIS 21254-1, 2].
Nonlinear optics
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- Femtosecond filamentation and supercontinuum generation in bulk materials with MHz, multi-MHz pulse repetition rates, and GHz bursts [Opt. Lett. 48, 4609-4612 (2023); Sci. Rep. 14, 7055 (2024)]
- Suppression of filamentation in refraction index modulated Kerr media numerical simulations using the beam propagation method reveals fine control of spatial dispersion achieved by tuning photonic crystal. Photonic crystals can be engineered to manage diffraction, compensating for self-focusing, thereby effectively delaying or eliminating beam filamentation. [Opt. Laser Technol. 169, 109973 (2024)]
- Development of efficient subnanosecond optical parametric generators and amplifiers tunable in the VIS, NIR, and mid-IR spectral range. Numerical simulation of the processes. [Opt. Laser Technol. 171, 110433 (2024); Infrared Phys. Technol. 137, 105158 (2024); Heliyon 10, e37513 (2024)].
- Exploring novel characterization techniques: PCF nonlinear response characterization [Opt. Express 32, 543408 (2024)]; semi-analytical non-iterative XFROG technique (Opt. Commun. 574, 131058 (2025); non-destructive nonlinear crystal periodic poling quality evaluation. [Optik 277, 170686 (2023)].
- Generation of broadband (up to 60 THz) terahertz radiation in laser-created air plasma driven by the fundamental and second harmonics of femtosecond and subpicosecond laser pulses [Appl. Phys. Lett. 124, 071113 (2024)].
- Development of advanced methods to generate and characterize complex dynamic beams with tunable spatial and temporal properties. Helical intensity beams capable of rotating at terahertz rates are created by superimposing chirped femtosecond pulses with distinct vorticity numbers. These beams exhibit dynamic interference patterns and controllable rotation speeds, offering precise spatiotemporal manipulation. Applications in laser micromachining demonstrate improved material processing with enhanced precision and efficiency through burst-like exposure mechanisms. [Opt. Laser Technol. 182, 112036 (2025); Phys. Rev. Appl. 17, 034059 (2022)]
Material Sciences (Advanced Materials Engineering)
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- 3D nano-structuring via x-photon polymerization of various organic-inorganic hybrid polymers [Light. Adv. Manuf. 5(4), 567 (2024)]
Laser Materials Processing
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- Hybrid laser processing and precision cutting of glass using chemical-assisted etching. Fabrication of MEMS devices from monolithic glass slabs for advanced sensing applications with capabilities to integrate 3D polymeric rods, highlighting subtractive and additive fabrication coactions. [Opt. Express 25(21), 26280-26288 (2017)].
- Deep laser engraving in glass with low surface roughness. Fine-tuning laser processing algorithms that can achieve deep engraving (>1 mm) in glass substrates with controllable surface roughness. [Surf. Interfaces. 50, 104471 (2024)].
- Design and Simulation of Periodic Complex Thin Film Devices. The ability to design and simulate periodic complex thin film devices has advanced significantly. Using rigorous numerical analysis and experimental validation, it is now possible to create thin films with periodically modulated interfaces that exhibit extremely narrow and sharply peaked resonances. [Phys. Rev. A 107, L061501 (2023)]
- Dynamic Aberration Correction via Spatial Light Modulator. An SLM-based approach has been introduced to correct optical aberrations in femtosecond direct laser writing, achieving near-spherical voxels with consistent aspect ratios. This technique simplifies processing in transparent media and enables high-quality 3D architectures. Applications span from micro-devices to embedded waveguides. [Opt. Express 28, 27850–27858 (2020)].
- Bessel Beam Fabrication of Transparent Optical Devices. Bessel beams enable the fabrication of compact, defect-free photonic crystal (PhC) spatial filters in transparent media, overcoming the limitations of Gaussian beams. This method allows for precise structuring with extended longitudinal dimensions, which is essential for creating transparent optical devices. These PhCs demonstrate enhanced spatial filtering performance, making them ideal for intra-cavity applications in micro-lasers and high-power lasers. [Opt. Lett. 44(20), 4969 (2019), Opt. Mater. Express 9, 1067–1078 (2019); J. Opt. Soc. Am. B 37, 1-9 (2020)]
Expertise
The infrastructure for laser material processing comprises originally designed laser direct writing 3D lithographic fabrication setup for developing of multifunctional and integrated micro-optical and micro-fluidic components, including 3D micro-/nano-structured luminescent glass-ceramics; laser direct writing setup for 3D micromachining, surface processing and prototyping micro and nanophotonic components in transparent materials with femtosecond laser pulses with IR and UV wavelengths, using either classical (Gaussian beam), or advanced (Gaussian-Bessel, flat-top) beam shapes; setup for design and characterization of beam shaping devices (photonic crystal spatial filters, photon sieves, embedded waveguides, etc.) embedded in bulk or surfaces of optical substrates for various applications in laser systems and advanced computational tool for simulating the optical performance of periodic thin-film devices: photonic crystals, anti-reflective coatings, and diffraction gratings.
Versatile, custom-designed, and flexible setups based on either commercial Ti:sapphire or Yb-based laser systems, equipped with second, third, and fourth harmonic generation units and widely-tunable optical parametric amplifiers, with various accessories for data acquisition and diagnostics, currently offer diverse experiments in time-resolved spectroscopy in the optical, far-infrared and THz spectral range, time-resolved laser-induced breakdown spectroscopy (LIBS) for chemical analysis (2D mapping, depth profiling) of materials, and ultrafast nonlinear optics in gases, solids and liquids, backed-up with originally-developed software for numerical simulations of nonlinear pulse propagation in various environments and operating conditions.
Standardized setups for destructive and non-destructive optics characterization by means of laser-induced damage threshold testing under vacuum and cryo-cooling and optical absorption loss measurements using common-path interferometry (PCI) in the wavelength range from the deep UV to mid-IR with ns, ps, and fs pulses for the development of advanced laser optics with improved performance and durability.
Services for industry
Manufacturing
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- Micromachining: State-of-the-art ultrafast laser processing capabilities on all types of material, including bulk processing of transparent glasses and crystals (3D integration of photonic devices).
- Surface processing: Surface patterning via laser ablation or laser-induced modification with unique patterns
Medical and Pharmaceutical
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- Micromachining: Laser processing on medical equipment and materials: drilling and cutting on catheters, etc.
Security/Defence
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- Micromachining: Production of secret markings in various materials (surface and bulk), fabrication of holograms via direct laser writing method.
Lasers
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- Laser damage testing: Expertise in laser damage phenomena, including destructive characterization of laser optics and the development of advanced laser optics for improved performance and durability.
Integrating photonic components
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- Prototyping: We have the capability of surface forming or bulk inscribing phase componencts on for beam shaping. Both simulations and micromachining are available.
Photonics/Lasers
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- Characterisation:
- Characterization of microcomponents designed for use in laser cavities. Relevant dimensions are 1-3 mm thickness (substrate). Primary charactirization is performed for transverse mode effects.
- We can perform the spectroscopy and charactersation of the new materials and light sources in the infrared and terahertz spectral ranges.
- We can perform FROG/XFROG characterization of ultrashort laser output radiation; photonic crystal fiber nonlinear and dispersive properties characterization
- Technology development for braodband parametric amplification, pulse postcompression down to few cycle pulse duration.
- High-per-formance computing: We can perform high performance design and simulation taks for thin and thick film periodic devices. Optimising spectral and directional response for Transmission and Reflection, suggesting architectures. Relevant for Semiconductor industry, Nanophotonics, Solar cells, Laser component surface functionalization.
- Technology development: Technology development for braodband parametric amplification, pulse postcompression down to few cycle pulse duration.
- Training: Training of research and production staff of laser companies in braod areas of nonlinear optics and its application.
- Characterisation:
Equipment offered to external users
VULRC facility provides a broad spectrum of laser and optical systems to support various research applications. Below is a brief summary of key experimental units available to external users, categorized by their primary functions and capabilities. A detailed list of all available equipment (UNITS), including technical specifications, is provided on the VULRC website.
Terawatt few optical cycle table-top OPCPA system (UNIT 1)
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- consisting of a front-end based on a commercial industrial-grade femtosecond Yb:KGW laser (Pharos, Light Conversion Ltd.), a specially designed diode-pumped Nd:YAG picosecond pump laser (Ekspla UAB), BBO crystal-based amplification stages and is equipped by precise spectral phase and wavefront control units. Main output parameters: pulse central wavelength 800 nm, pulse duration down to 8 fs, pulse energy up to 8 mJ, repetition rate 1 kHz. Additional units providing few optical cycle pulses at ~2 µm are under development. The system is dedicated for studies of nonlinear optical interactions of few optical cycle pulses, laser radiation and matter interaction, laser damage threshold tests and testing of commercial non-linear optical devices. The prospective of application areas are coherent X-ray emission via high-order harmonic generation, incoherent femtosecond hard X-ray generation in laser-induced plasma, isolated attosecond pulse generation, attosecond pump-probe spectroscopy.
Home-built Very High Repetition Rate and High Average Power FCPA Laser System (UNIT 11)
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- based on Yb:KGW oscillator (FLINT, Light Conversion Ltd.) and diode-pumped Yb-doped polarization-maintaining double clad rod-type fiber amplifier (aeroGAIN-ROD-PM85, NKT Photonics), delivering 110 fs pulses at 1034 nm, with 76 MHz repetition rate and 70 W average power (30 W at the second harmonics) for experiments in ultrafast nonlinear optics, e.g. pulse post-compression, frequency conversion based on optical parametric amplification, studies of spectral broadening in PCF, etc., with SHG-FROG and XFROG characterization.
- based on Yb:KGW oscillator (FLINT, Light Conversion Ltd.) and diode-pumped Yb-doped polarization-maintaining double clad rod-type fiber amplifier (aeroGAIN-ROD-PM85, NKT Photonics), delivering 110 fs pulses at 1034 nm, with 76 MHz repetition rate and 70 W average power (30 W at the second harmonics) for experiments in ultrafast nonlinear optics, e.g. pulse post-compression, frequency conversion based on optical parametric amplification, studies of spectral broadening in PCF, etc., with SHG-FROG and XFROG characterization.
Femtosecond Laser Micromachining System with 5D (3 linear axes + 2 rotation axes) Nanopositioning (UNIT 8)
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- capabilities with conventional (direct focusing) and scanning heads. A primary laser source is the femtosecond laser system CARBIDE, operating at 40 W power (max 400 µJ per pulse), 210 fs pulse duration, 1-1000 kHz repetition rate, with II harmonics (max 22 W @602.7 kHz), III harmonics (max 11W @602.7 kHz) and IV harmonics (max 2 W @602.7 kHz). Laser provides a burst feature of 600 MHz (max nine pulses per burst) and 2.1 GHz (max 25 pulses in burst) and COMBO regime. The positioning stage includes ANT130XY-160 (XY axis- travel range 160 mm x 160 mm, repeatability ±75 nm, resolution ± 1 nm) and Aerotech ANT130 LZ-060 (Z-axis – travel range 60 mm, repeatability ±75 nm, resolution ±2nm) linear tables and ADRS150 and ANT130R rotational tables. The system can be utilized with galvanometric scanners for f-theta focusing at all harmonics implementing ScanLab ExcelliiScan 14 and IntelliScan 14 galvanometric scanners, or custom processing heads (Bessel beam, squared flat top beam (at 1030 nm wavelength using Canundra (Caillabs) converter)). The system is fully automatized with dedicated software DMC Pro and SCA. The micromachining laboratory is supported by an additional infrastructure that includes optical characterization techniques (optical microscopes Olympus BX53, IX73, surface profilometer Olympus LEXT OLS5100, Sensofar plu5300, SEM microscopes HITACHI TM-1000, THERMO SCIENTIFIC INC. PRISMA E, and customized optical laboratory systems, the laboratory has access to state of the art modeling software Optics Studio, RSOFT Photonics Device Tools (FDTD, RCWA, beam propagation modules), Lumerical (FDTD).
A Versatile Ultrafast Spectroscopy Laboratory (UNIT 3)
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- backed by Ti: Sapphire (50fs, 1KHz, 800 nm) and Yb: KGW (220 fs, 1-200 kHz, 1030 nm) lasers, optical parametric amplifiers, and harmonic generators covering excitation wavelength range from 220 nm to 20 µm. Fully automated spectrometers, including commercial Harpia-TA and Harpia-TF system (Light Conversion Ltd.) for two- and three-beam transient absorption, femtosecond Raman scattering, and time-resolved fluorescence (up-conversion, Kerr-shutter, and TCSCP) measurements. Cryogenic spectroscopic experiments at temperatures 77-300K. Micro-pump probe setup for samples with dimensions <50×50 um.
Laser-Induced Breakdown Spectroscopy (LIBS) System (UNIT 29-31)
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- for in-depth chemical composition analysis of various materials under various environmental conditions, 2D mapping, and online monitoring of laser micromachining using interaction chamber for time-resolved femtosecond/nanosecond LIBS research. The interaction chamber offers safety during the analysis; intuitive software, interactive online sample view; motorized 3-axis sample manipulation; possibility to define analysis points or different paths and grids for 2D mapping with motion resolution < 2 µm; pressure range within 1-1300 mbar with different atmospheres e.g. He, Xe, CO2; laser beam focusing devices, collection of plasma radiation in the spectral range of 178 – 1000 nm. Laser source: Pharos (Light Conversion Ltd.) 6W average power diode-pumped high repetition rate (1-200 kHz) femtosecond Yb:KGW laser. Centre wavelength 1030 nm, pulse duration 200 fs. The second (515 nm) and third (343 nm) laser harmonics are available for LIBS analysis via Andor Mechelle 5000 spectrograph and compact FREEDOM HR-DUV UV fiber spectrometer.
Widely Tunable High Repetition Rate Femtosecond Laser System (UNIT 2)
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- consisting of Yb:KGW laser (Pharos, Light Conversion Ltd.) providing 180 fs, 1035 nm pulses with repetition rate up to 200 kHz and optical parametric amplifier (Orpheus-HP, Light Conversion Ltd., wavelength tuning range 1.3-5 µm) with difference-frequency generation unit (wavelength tuning range 5-18 µm), dedicated to studies of ultrafast light-matter interactions (femtosecond filamentation, supercontinuum generation in transparent bulk materials and light-induced modifications therein) in temporal, spatial and spectral domains with automated data acquisition system.
Optics Characterization Using Laser-Induced Damage Threshold (LIDT) Testing (UNIT 4)
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- under vacuum and cryo-cooling. Primary Laser Sources: INNOLAS SpitLight Hybrid (Nd:YAG): Wavelengths 1064, 532, 355, 266, 213 nm; 1–100 Hz; 30 W @ 100 Hz (1064 nm); 8 ns pulse; 400 mJ max energy. COHERENT LEGEND (Ti:Sapphire): Wavelength 800 nm; 1 kHz; 3.5 W @ 1 kHz; 50–100 fs pulses (adjustable to 0.05–10 ps); HE-TOPAS spectral range 240–12000 nm. EKSPLA NL303 (Nd:YAG): Wavelengths 1064, 532, 355, 266 nm; 10 Hz; 30 W @ 50 Hz (1064 nm); 3–6 ns pulse.
Optics Characterization, including Optical Absorption Loss and Nonlinear Absorptance Measurements (UNIT 14)
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- using common-path interferometry (PCI). Laser Source: ATLANTIC 80-IR-GR40-UV30-VP (Ekspla): Output power @ 400 kHz: > 80 W (1064 nm, > 200 μJ); > 40 W (532 nm, > 100 μJ); > 30 W (355 nm, 75 μJ). Pulse duration: fixed 10 ± 3 ps or tunable 150–400 ps (1064 nm).